International Symposium on Nanoscale Pattern Formation at Surfaces, Copenhagen (Denmark). 26-30 May 2013
Publication date: 2013-05-26.
Citation:
A. Moreno Barrado, M. Castro, Molecular dynamics of ion beam implantation of xenon, argon and silicon in crystalline silicon, International Symposium on Nanoscale Pattern Formation at Surfaces, Copenhagen (Denmark). 26-30 May 2013.
